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石英晶片表面化学机械抛光试验研究
  • 所属机构名称：清华大学
  • 会议名称：2009年第九届中国摩擦学大会，10.18 -10.20，2009，北京.
  • 成果类型：会议
  • 相关项目：类球形有机大分子抛光液设计及其原子级抛光机理
同会议论文项目
类球形有机大分子抛光液设计及其原子级抛光机理
期刊论文 22 会议论文 19 获奖 2
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Material Removal and Surface Modification in Chemical Mechanical Polishing of GaAs Wafer
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Numerical Analysis on Lubrication Characteristics of Nanometer Gas Film in Hard Disk Drive
Inertial force measurement of an actuator arm of a hard disk drive in free oscillation by numerical
Design considerations for reducing shock responses of a micro-drive.
Numerical Analysis on Dynamic Characteristics of Flying Magnetic head with Ultra Thin spacing.
Effect of Ingredients in Slurry Containing Alumina on Chemical Mechanical Polishing of Hard Disc Sub
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硅烷偶联剂改性二氧化硅颗粒及其超精抛光性能研究
离子交换法提高硅晶片抛光液去除速率试验研究
抛光液特性对计算机硬盘盘基片表面抛光性能的影响