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Stress-a possible fundamental reason for the formation of natural patterns
  • 所属机构名称：浙江理工大学
  • 会议名称：The 2nd International Symposium “Interface Mineralogy”
  • 成果类型：会议
  • 相关项目：曲面应力体系皱褶规律的研究和有序结构的实现
作者： C.R.Li|
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曲面应力体系皱褶规律的研究和有序结构的实现
期刊论文 29 会议论文 18
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