位置：成果数据库 > 会议 > 会议详情页
Optimal configuration for the dual rotating-compensator Mueller matrix ellipsometer
  • 所属机构名称：华中科技大学
  • 会议名称：8th International Symposium on Precision Engineering Measurements and Instrumentation
  • 时间：2013
  • 成果类型：会议
  • 相关项目：基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究
作者： Du, Weichao|Liu, Shiyuan|Zhang, Chuanwei|Chen, Xiuguo|
同会议论文项目
基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究
期刊论文 13 会议论文 11 专利 6
同项目会议论文
Correction on the effect of numerical aperture in optical scatterometry
Optimal design of periodic nanostructures formed in solar cells as an antireflective layer
Reduction of measurement errors with two-channel configuration in the Mueller matrix ellipsometer
Analysis and extraction of misalignment errors in a three-in-one composite wave-plate with an equiva
Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry
Zernike representation of angle-resolved Mueller matrix for dimensional analysis of nanoscale struct
Modeling and simulation of through-focus images for dimensional analysis of nanoscale structures
Sensitivity analysis for nanostructure metrology by Mueller matrix polarimetry
Classification and recognition of diffraction structures using support vector machine in optical sca
Estimation of the convergence order of rigorous coupled-wave analysis for OCD metrology