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Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry
  • 所属机构名称：华中科技大学
  • 会议名称：27th Conference on Metrology, Inspection, and Process Control for Microlithography
  • 时间：2013
  • 成果类型：会议
  • 相关项目：基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究
作者： Chen, Xiuguo|Liu, Shiyuan|Zhang, Chuanwei|Jiang, Hao|
同会议论文项目
基于红外椭偏光谱的高深宽比深沟槽结构侧壁形貌参数测量方法研究
期刊论文 13 会议论文 11 专利 6
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