欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
会议
> 会议详情页
Global Interconnect Analysis and Optimization for Nanometer Scale VLSI
所属机构名称:上海交通大学
成果类型:会议
相关项目:片上系统的互连问题与高端IP核研究
同会议论文项目
片上系统的互连问题与高端IP核研究
期刊论文 71
会议论文 10
获奖 6
同项目会议论文
A Novel Time-domain Integration Method for Transient Analysis of Nonuniform Transmission Lines
Carbon Nanotube Vias: A Reality Check
Parameter Characterization of Silicon-Based Patterned Shield and Patterned Ground Shield Coplanar Wa
An Artificial Magnetic Material with Interdigital Structure
Wideband Lumped Element Model for On-Chip (A)symmetrical Coupled Interconnects on Lossy Silicon Subs
Modeling of Carbon Nanotube Interconnects and Comparative Analysis with Cu Interconnects
A Compact Circuit Model of On-Chip Multi-layer Spiral Inductors on Silicon Substrate
Performance ofA Multi-Port Multi-Channel RE-Interconnect Model
An Efficient Unconditionally Stable Three-Dimensional LOD-FDTD Method