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Analysis of film thickness for magnetron sputtering system with more than one workbench
所属机构名称:电子科技大学
会议名称:2009 International Conference on Optical Instruments and Technology, OIT 2009
成果类型:会议
会场:Shanghai, China
相关项目:信息薄膜与LTCC集成器件
作者:
He, Yu|Jing, Jiang|Tao, Wang|Zhiming, Wu|Hongjun, Jing|Yadong, Jiang|
同会议论文项目
信息薄膜与LTCC集成器件
期刊论文 200
会议论文 42
获奖 6
专利 81
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