AlOx薄膜作为高效太阳能电池中P层钝化薄膜引起了光伏龙头企业的关注。本文利用最新研发的微波等离子增强化学气相沉积(MW-PECVD)系统,在单晶硅基体上用不同微波功率和生长温度制备氧化铝膜层样品,并通过扫描电镜、SE800椭偏仪和WT2000少子寿命测量仪对薄膜的成分、表面形貌、厚度、沉积速度、钝化性能进行分析。实验结果表明,LMW-PECVD制备的AlOx薄膜沉积速度快且薄膜质量高,适用于大规模企业生产。此外,微波功率和生长温度都对AlOx薄膜的钝化性能有着显著的影响。
The AlOxcoatings,grown by microwave plasma enhanced chemical vapor deposition( MW-PECVD)on substrate of p-type Si wafer for fabrication of high efficiency solar cells on industrial scale,were passivated. The impact of the microwave power,substrate temperature,deposition-rate and film thickness,on the microstructures and properties of the AlOxcoatings was investigated with scanning electron microscopy,ellipsometry and measurement of the minority carrier lifetime( WT2000). The results show that MW-PECVD is capable of synthesizing high quality AlOxcoatings at a fast deposition-rate on industrial scale. For example,as the microwave power increased,the deposition-rate rapidly increased to 101 nm / min till 1200 W,and then remained almost unchanged;as the temperature increased,the deposition-rate changed in an increase-decrease mode,peaking at 350℃. Deposited at a power in1200 ~ 1300 W range and at 400℃,the minority carrier lifetime of the AlOx/ Si,with film thicker than 25 nm,was up to 160 μs.