中文摘要：

CN x /SiCN 合成电影在由收音机频率血浆的合金底层提高了的钛(Ti ) 上被准备化学蒸汽免职(RF-PECVD ) 。作为缓冲区层， SiCN 在 Ti 底层上保证了 CNx 薄电影的粘附。X 光检查衍射(XRD ) 测量表明合成电影拥有了伪 - C3N4 结构。这些电影的 microhardness 是 48 ～ 50 GPa。以便测试特征穿并且腐蚀电阻，我们有或没有 CN x /SiCN 准备了 Ti 合金样品合成电影。另外为加强效果穿并且腐蚀， wear 测试在高负担(12 MPa ) 下面并且在 0.9% NaCl 答案被执行。电气化学的大小显示出的 wear 测试和腐蚀剂的结果与 CN x 电影涂的样品有优秀特征穿并且腐蚀电阻与 Ti 合金底层样品相比。

英文摘要：

CN x /SiCN composite films were prepared on titanium (Ti) alloy substrates by Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF-PECVD). As a buffer layer, SiCN ensured the adhesion of the CNx thin films on Ti substrates. X-ray diffraction (XRD) measurement revealed that the composite films possessed α-C3N4 structure. The microhardness of the films was 48 to 50 GPa. In order to test the characteristics of wear and corrosion resistances, we prepared Ti alloy samples with and without CN x /SiCN composite films. Also for strengthening the effect of wear and corrosion, the wear tests were carried out under high load (12 MPa) and in 0.9% NaCl solution. Results of the wear tests and the corrosive electrochemical measurements showed that the samples coated with CN x films had excellent characteristics of wear and corrosion resistances compared with Ti alloy substrate samples.