中文摘要：

采用分离靶电弧离子镀制备TiN／TiAlN多层薄膜。为了减少大颗粒的不利影响，利用直线型磁过滤方法来减少低熔点铝靶产生的大颗粒。结果表明，没有过滤的钛靶和磁过滤的铝靶等离子体到达基体的输出量在相同的数量级，同时，采用该方法制备的薄膜中的大颗粒数目是文献中报道的合金靶制备的薄膜大颗粒数目的1／10-1／3。Al元素的添加引起薄膜在（200）晶面的峰值降低，而在（111）和（220）晶面的峰值增强。TiN／TiAlN多层薄膜的最大硬度为HV2495，薄膜的硬度增强符合混合法则，结合力达75N。

英文摘要：

TiN/TiAlN multilayer coatings were prepared by arc ion plating with separate targets. In order to decrease the unfavorable macroparticles, a straight magnetized filter was used for the low melting aluminium target. The results show that the output plasmas of titanium target without filter and aluminium target with filter reach the substrate with the same order of magnitude. Meanwhile, the number of macropartieles in TiN/TiAlN multilayer coatings deposited with separate targets is only 1/10-1/3 of that deposited with alloy target reported in literature. Al atom addition may lead to the decrease of peak at （200） lattice plane and strengthening of peak at （111） and （220） lattice planes. The measured hardness of TiN/TiAlN multilayer coatings accords with the mixture principle and the maximum hardness is HV2495. The adhesion strength reaches 75 N.