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Reactive magnetron sputtering deposition and characterization of niobium carbide films
  • ISSN号：0042-207X
  • 期刊名称：Vacuum
  • 时间：2014.1
  • 页码：233-241
  • 相关项目：氮化铪膜作为新型红外增透保护膜材料的研究
作者： Zhang, Kan|Wen, M.|Cheng, G.|Li, X.|Meng, Q. N.|Lian, J. S.|Zheng, W. T.|
同期刊论文项目
氮化铪膜作为新型红外增透保护膜材料的研究
期刊论文 19
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Reactive magnetron sputtering deposition and characterization<br /> of niobium carbide films
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