中文摘要：

采用喷施硝酸铵（NH4NO3）模拟氮沉降对温郁金叶丛期叶面积形成的影响。试验设对照（CK）、低氮（T50）、中氮（T100）和高氮（T150）4个处理组,对应的氮沉降量分别为0、50、100、150 kg.hm-2.a-1。结果表明,T150、T100处理能显著提高温郁金总叶面积、主秆茎单叶面积和额外叶面积（P〈0.05）。与CK相比,在T150、T100处理下,温郁金总叶面积分别提高了151.71%和112.89%;主秆茎单叶面积也分别提高了27.81%和19.71%（8月份）;氮沉降对主秆茎的叶片数目无显著影响。高浓度和中浓度的氮沉降对温郁金叶丛期叶面积的形成具有促进作用,氮沉降主要通过增加温郁金主秆茎单叶面积和额外叶面积来增加总叶面积。

英文摘要：

To evaluate the responses of leaf area of the medicinal plant Curcuma aromatica ＇ Wenyujin＇ during the stage of leaf growth to elevated nitrogen （N） deposition, the dissolved NH4NO3 was sprayed on leaf of C. aromatica from June to September in 2009. The simulated elevated N depositions were equivalent to O （CK） , 50 （T50）, 100 （T100） and 150 （T150） kg - hm^-2 - a^-1 The results showed that nitrogen deposition significantly （ P 〈 0.05 ） enhanced the formation of leaf area during the stage of leaf growth. Compared to the control, the total leaf area in Aug was enhanced by 151.71% and 112.89% treated with T150 and T100, respectively. The single leaf area of main stem was enhanced by 27.81% and 19.71% with T150 and T100 treatments individually. However, the number of leaves on main stem was not significantly affected. Overall, high nitrogen deposition （T100） and intermediate nitrogen deposition （ T150 ） were benefit to the formation of leaf area of C. aromatica during the stage of leaf growth through the enhancement of individual leaf area and extra leaf area.