ZrC 涂层被低压力在石墨底层上扔有 Br 的化学蒸汽免职(LPCVD )2-Zr-C3 H 6-H2-Ar 系统。微观结构和 ZrC 涂层的生长行为上的免职时间的效果被调查。ZrC 涂层在一个岛层模式成长了。涂层的形成被 ZrC 的成核统治在起始 20 分钟,和快速的成核产生了 ZrC 的有细密纹理的结构涂层。免职时间什么时候在 30 min 上,涂层的生长被统治由晶体,给安排列的结构。精力散 X 光检查光谱学证明到锆的碳的臼齿的比率在在 ZrC 涂层,和 X 光检查的 1:1 附近显示出的光电子光谱学 ZrC 是在涂层的主要阶段,由大约 2.5mol% 伴随了 ZrO 2 次要的阶段。
ZrC coatings were deposited on graphite substrates by low pressure chemical vapor deposition(LPCVD) with the Br2-Zr-C3H6-H2-Ar system. The effects of deposition time on the microstructures and growth behavior of ZrC coatings were investigated. ZrC coating grew in an island-layer mode. The formation of coating was dominated by the nucleation of ZrC in the initial 20 minutes, and the rapid nucleation generated a fine-grained structure of ZrC coating. When the deposition time was over 30 min, the growth of coating was dominated by that of crystals, giving a column-arranged structure. Energy dispersive X-ray spectroscopy showed that the molar ratio of carbon to zirconium was near 1:1 in ZrC coating, and X-ray photoelectron spectroscopy showed that ZrC was the main phase in coatings, accompanied by about 2.5mol% ZrO2 minor phase.