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Effect of sputtering bias voltage on the structure and properties of Zr-Ge-N diffusion barrier films
  • ISSN号：0257-8972
  • 期刊名称：Surface and Coatings Technology
  • 时间：2013.8.8
  • 页码：S237-S240
  • 相关项目：Cu/low-k介质阻挡层异质界面等离子体耦合强化设计及相关性能研究
作者： Lin, L. W.|Liu, B.|Ren, D.|Zhan, C. Y.|Jiao, G. H.|Xu, K. W.|
同期刊论文项目
Cu/low-k介质阻挡层异质界面等离子体耦合强化设计及相关性能研究
期刊论文 17 会议论文 2
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