在不同马赫数和努森数条件下,采用DSMC方法对微通道库埃特流动进行直接模拟。结果表明:近壁处速度滑移随着Kn数的增加而增大,增加壁面平移速度将会导致板间的气体温度和压力随之显著增加。在过渡流区,气流速度的增幅受到Kn(努森)层的抑制,在接近自由分子流区后逐渐分布均匀;通道内温度和压力呈现中间高、近壁区域低的分布,在流动趋向自由分子流时,通道内温度和压力分布趋向均匀。
this paper discusses the micro channel Couette flow in vary Ma and Kn number using DSMC method. The slip velocity near plates increases by Kn number, and the gas temperature and pressure will increase remarkably along with the increasing of the plate velocity. In transition flow region, the velocity's amplification is kept back by Kn layer, the velocity becomes uniform distribution when approaching free molecule flow; the distributions of temperature and pressure in micro channel is high in the middle and low near the plates, and uniform when approaching free molecule flow region.