中文摘要：

分别通过N-（声-羟基苯基）甲基丙烯酰胺与N-苯基马来酰亚胺、N-苯基甲基丙烯酰胺与N-（p-羟基苯基）马来酰亚胺的共聚合，制备了两种聚合物树脂聚N-（P-羟基苯基）甲基丙烯酰胺共M苯基马来酰亚胺（poly（HPMA—CO—PMI））和聚N-苯基甲基丙烯酰胺共N_（P-羟基苯基）马来酰亚胺（poly（MPA—CO—HPMI））．结果表明，这两种聚合物都是按1：1的摩尔比交替共聚的，它们都具有良好的溶解性、成膜性和亲水性，并且它们的玻璃化温度瓦都在280℃以上．将它们分别与感光剂2，1，5-磺酰氯的衍生物、助剂二苯甲酮等复配成两种紫外正型光刻胶，初步光刻实验表明，其最大分辨率都可以达到1肚m，并且都可以耐270℃的高温．

英文摘要：

Two copolymers poly （ （N- （p-hydroxyphenyl）methacrylamide）-co-（N-phenylmaleimide）） poly（HPMI-co-PMA） and poly （ （N phenylmethacrylamide）-co-（N~ （p-hydroxyphenyl） maleimide） ） poly （PMAco-HPMI） were prepared from the copolymerizations of N-（p-hydroxyphenyl） methacrylamide and N-phenylmaleimide, and N-phenylmethacrylamide and N-（p-hydroxyphenyl） maleimide, respectively. It showed that both copolymers were 1 ~ 1 in molar composition and were alternating. Both had good solubility in organic solvent, film-forming characteristics, hydrophilicity, and high glass transition temperature （T〉280℃）. As matrix resins, they were mixed respectively with photosensitizer derivative of 2, 1, 5-diazonaphthoquinone sutfochloride （DNS）, additive benzophenone, etc. to obtain two UV positive photoresist. Preliminary photolithographic experiments testified that both photoresists had a resolution of no less than 1 μm and a high- thermostability of up to 270℃.