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EPIR effect of Cu2O films by electrochemical deposition
  • ISSN号：1567-1739
  • 期刊名称：Current Applied Physics
  • 时间：2014.9
  • 页码：1282-1286
  • 相关项目：缺陷、深能级陷阱与CaCu3Ti4O12巨介电常数之间的关系
作者： Yang, R.|Xiao, H. B.|Baerner, K.|Marchenkov, V. V.|
同期刊论文项目
缺陷、深能级陷阱与CaCu3Ti4O12巨介电常数之间的关系
期刊论文 50
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