位置:成果数据库 > 期刊 > 期刊详情页
视频处理器中电荷泵锁相环设计
  • ISSN号:1003-353X
  • 期刊名称:《半导体技术》
  • 时间:0
  • 分类:TN15[电子电信—物理电子学] TP393.1[自动化与计算机技术—计算机应用技术;自动化与计算机技术—计算机科学与技术]
  • 作者机构:[1]Institute of Electronic Engineering and Optoelectronic Technology,Nanjing University of Science and Technology, Nanjing 210094, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Grant Nos. 60801036 and 61067001); the Key Science and Technology Project of Henan Province of China (Grant No. 112102210202); and the Research and Innovation Plan for Graduate Students of Jiangsu Higher Education Institutions of China (Grant No. CX09B_096Z).
中文摘要:

<正>Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response,one has a gradient-doping structure and the other has a uniform-doping structure.The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one.As a result of the downward graded band-bending structure,the cathode performance parameters,such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves,are greater for the gradient-doping photocathode.The electron diffusion length is within a range of from 2.0 to 5.4μm for doping concentration varying from 1019 to 1018 cm-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2μm.

英文摘要:

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4μm for doping concentration varying from 10^19 to 10^18 cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.

同期刊论文项目
期刊论文 13 会议论文 2 获奖 6 专利 2
同项目期刊论文
期刊信息
  • 《半导体技术》
  • 中国科技核心期刊
  • 主管单位:中国电子科技集团公司
  • 主办单位:中国电子科技集团公司第十三研究所
  • 主编:赵小玲
  • 地址:石家庄179信箱46分箱
  • 邮编:050051
  • 邮箱:informax@heinfo.net
  • 电话:0311-87091339
  • 国际标准刊号:ISSN:1003-353X
  • 国内统一刊号:ISSN:13-1109/TN
  • 邮发代号:18-65
  • 获奖情况:
  • 中文核心期刊,中国科技论文统计用刊
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘(网络版),美国剑桥科学文摘,英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:6070