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三甲川菁染料H-聚集体薄膜的线性及三阶非线性光学性能研究
  • ISSN号：0023-074X
  • 期刊名称：《科学通报》
  • 时间：0
  • 分类：TN304.52[电子电信—物理电子学]
  • 作者机构：[1]光谱学与波谱学教育部重点实验室、华东师范大学物理系,上海200062, [2]华东理工大学材料科学与工程学院,上海200237
  • 相关基金：国家自然科学基金（批准号：10234030和10574046）、国家重点基础研究发展计划（编号：1999075204）、教育部新世纪人才计划（批准号：NCET-04-0420）、高等学校博士点基金（批准号：20050269011）和上海市教委曙光学者计划（批准号：03SG23）资助项目
作者： 元以中[1,2], 康海峰[1], 孙真荣[1], 王祖赓[1]
关键词： 旋涂膜, H-聚集体, 三阶非线性光学
中文摘要：

采用旋涂法制备了一种七甲川菁染料的超薄膜，利用原子力显微和紫外．可见吸收光谱等技术对膜的形貌和线性光谱性质进行了研究表征，结果表明染料在薄膜中形成了有序而稳定的H-聚集体．前向简并四波混频技术研究表明由于分子的聚集作用引起三阶非线性极化率的增大，利用集体谐振子模型初步分析和讨论了产生非线性效应增强的内在机制．

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期刊信息
  • 《科学通报》
  • 北大核心期刊（2011版）
  • 主管单位:中国科学院
  • 主办单位:中国科学院
  • 主编：周光召
  • 地址：北京东黄城根北街16号
  • 邮编：100717
  • 邮箱：csb@scichina.org
  • 电话：010-64036120 64012686
  • 国际标准刊号：ISSN：0023-074X
  • 国内统一刊号：ISSN：11-1784/N
  • 邮发代号:80-213
  • 获奖情况:
  • 首届国家期刊奖,中国期刊方阵“双高”期刊,第三届中国出版政府奖
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  • 被引量:81792