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Graded bandgap semiconductor thin film photoelectrodes
  • ISSN号:1002-185X
  • 期刊名称:《稀有金属材料与工程》
  • 时间:0
  • 分类:O472.1[理学—半导体物理;理学—物理]
  • 作者机构:[1]Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China, [2]Zhejiang Univ, Dept Phys, Hangzhou 310027, Peoples R China, [3]Kyoto Univ, Chem Res Inst, Uji, Kyoto 6110011, Japan
  • 相关基金:the National Natural Science Foundation of China (Grant Nos. 59902006 and 69890230).
中文摘要:

【Abstract】A graded bandgap oxide semiconductor thin film electrode was designed in order to obtain a photoelec-trochemically stable photoelectrode, with wide absorption range. The graded bandgap Ti1-xVxO2 film electrode was prepared by heating the stacked layers of V/Ti in varying ratios, which were coated on the substrate by the sol-gel method using the starting solution with various V/Ti ratios. XPS result showed that the composition gradient was achieved for the film. The Ti1-xVxO2 film electrode was found to be photoelectrochemically stable. Its photovoltage was about 360 mV. Obvious visible light photoresponse was observed for the Ti1-xVxO2 film electrode. Compared with the pure TiO2 electrode, the photocurrent onset potential of the Ti1-xVxO2 film electrode was shifted positively, probably because the accumulation of vanadium at the electrode surface causes the recombination of the electrons and holes, and the lowest level of the conduction band of Ti1-xVxO2 is lower than that of TiO2. Impedance analys

英文摘要:

A graded bandgap oxide semiconductor thin film electrode was designed in order to obtain a photoelec-trochemically stable photoelectrode, with wide absorption range. The graded bandgap Ti1?x V x O2 film electrode was prepared by heating the stacked layers of V/Ti in varying ratios, which were coated on the substrate by the sol-gel method using the starting solution with various V/Ti ratios. XPS result showed that the composition gradient was achieved for the film. The Ti1?x V x O2 film electrode was found to be photoelectrochemically stable. Its photovoltage was about 360 mV. Obvious visible light photoresponse was observed for the Ti1?x V x O2 film electrode. Compared with the pure TiO2 electrode, the photocurrent onset potential of the Ti1?x V x O2 film electrode was shifted positively, probably because the accumulation of vanadium at the electrode surface causes the recombination of the electrons and holes, and the lowest level of the conduction band of Ti1?x V x O2 is lower than that of TiO2. Impedance analysis showed that the donor density of the Ti1?x V2O2 film electrode was higher than that of TiO2 film electrode.

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期刊信息
  • 《稀有金属材料与工程》
  • 中国科技核心期刊
  • 主管单位:中国科学技术协会
  • 主办单位:中国有色金属学会 中国材料研究学会 西北有色金属研究院
  • 主编:张平祥
  • 地址:西安市51号信箱
  • 邮编:710016
  • 邮箱:RMME@c-nin.com
  • 电话:029-86231117
  • 国际标准刊号:ISSN:1002-185X
  • 国内统一刊号:ISSN:61-1154/TG
  • 邮发代号:52-172
  • 获奖情况:
  • 首届国家期刊奖,中国优秀期刊一等奖,中国有色金属工业优秀期刊1等奖
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国科学引文索引(扩展库),英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:24715