亚稳态分子间复合物(MIC)阵列由于具有高能量密度、小尺寸条件下能自持反应的优点,在集成化火工品方面具有潜在的应用价值。采用火焰法在硅基底上原位制备了高度有序的MoO3纳米片阵列,探讨了基底材料、纳米阵列生长时间、火焰源因素对生成MoO3形貌的影响,得到了 MoO3纳米片阵列的优化制备工艺条件: 以硅片为基底,生长时间为5 min和甲烷为火焰源。制备的纳米片厚度为100~200 nm,宽度约5 μm,长度达到十几个微米。分别采用磁控溅射和热蒸发在MoO3纳米片阵列表面镀铝得到Al/MoO3 MIC阵列,在铝膜厚度相同的情况下,采用热蒸发镀铝方式优于磁控溅射。热蒸发铝膜厚度为900 nm时,所获得的Al/MoO3 MIC阵列具有较高的放热量,达到3276 J·g-1。
With high energy density and self-sustained combustion under the condition of small size, metastable intermolecular composites (MIC) array has potential value in the application of intergrated initiating explosive devices. In the current study, highly ordered MoO3 nanobelts array was prepared by a flame method. The possible factors which may influence the morphology of MoO3 nanobelts, such as different substrate, growing time, and the flame source, were also studied. The optimal conditions for growing MoO3 nanobelts array were obtained as follows: utilizing Si as the substrate and CH4 gas as the flame source with the growing time of 5 min.The as-synthesized MoO3 nanobelts possess a thickness of ~5 nm, a width of ~5 μm, and a length larger than 10 μm. And then MIC-Al/MoO3 array was prepared by aluminum plating on the surface of MoO3 nanobelts via the magnetron sputtering and thermal evaporation method respectively. The results show that MIC-Al/MoO3 fabricated by thermal evaporation method has higher heat release (3276 J·g-1) compared that by the magnetron sputtering method with the same aluminum film thickness.