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Effect of oxide buffer layer on the microstructure and dielectric properties of PLZST 2/87/10/3 anti
  • 期刊名称：Journal of Crystal Growth
  • 时间：2010.12.12
  • 页码：151-156
  • 相关项目：高功率密度反铁电厚膜材料储能行为及疲劳机理研究
作者： Xihong Hao, Jiwei Zhai, Zhenxing Yue, Jing Zhou,|Shengli An|
同期刊论文项目
高功率密度反铁电厚膜材料储能行为及疲劳机理研究
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