位置：成果数据库 > 期刊 > 期刊详情页
Study of etched ion track profiles in silicon dioxide membrane
  • ISSN号：1350-4487
  • 期刊名称：Radiation Measurements
  • 时间：0
  • 页码：S627-S631
  • 语言：英文
  • 相关项目：荷能重离子径迹刻蚀法制备硅基膜纳米孔道
作者： Liang, A. F.|Liu, Y. D.|Zhang, W. M.|Guo, W.|Li, J.|Xue, J. M.|Wang, Y. G.|
同期刊论文项目
荷能重离子径迹刻蚀法制备硅基膜纳米孔道
期刊论文 8
同项目期刊论文
A biomimetic potassium responsive nanochannel: G-quadruplex DNA conformational switching in a synthe
Fabrication and investigation of single track-etched nanopore and its applications
Nanofluidic diode generated by pH gradient inside track-etched conical nanopore
Gating of Single Synthetic Nanopores by Proton-Driven DNA Molecular Motors
Wet etching of GaN damaged by heavy ion irradiation
Fabrication of nanoporous silicon dioxide/silicon nitride membranes using etched ion track technique
Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation