使用脉冲激光沉积(PLD)依次沉积氧化铝和碳膜制备了a-C:Fe/AlOx/Si基异质结,研究了其光伏效应及其在太阳能电池上的应用.该太阳能电池在标准日光照射(AM1.5,100mW/cm^2)下,可获得0.33V的开路电压和4.5mA/cm2的电流密度,太阳能电池的转换效率为0.35%.通过C-V测量,证明了氧化铝层的引入降低了界面能级数目,增加了界面势垒高度.界面能级数目降低减少了光生载流子在界面复合的概率,有利于光电流和光电压的产生.
The photovoltaic effect of a-C: Fe /AlOx /Si based heterostructures prepared by Pulsed Laser Deposition ( PLD) and its applications for solar cells were investigated. Thin alumina layer with a thickness of ~ 2nm was introduced to the interface between carbon and silicon,and the photovoltatic properties,such as open circuit voltage of ~ 0. 33 V and short current density of ~ 4. 5 mA /cm^2,were improved dramatically compared with the samples without the insulation alumina layer. This may be related to the improvement of interface quality,where there are lower recombination centers such as defects and traps,which are approved by the C-V measurement. This work may shed light on the carbon /silicon based solar cells.