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Preparation of high-quality colloidal mask for nanosphere lithography by a combination of air/water
  • ISSN号：0743-7463
  • 期刊名称：Langmuir
  • 时间：2012.8.28
  • 页码：12681-12689
  • 相关项目：（2+1）维自组装光子晶体超晶格研究
作者： Tan Tianya|Wang Xiaoqing|Yan Qingfeng|Shen Dezhong|
同期刊论文项目
（2+1）维自组装光子晶体超晶格研究
期刊论文 31 会议论文 8
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