欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Anisotropic etching of microscale beta-FeSi2 particles: Formation, mechanism, and quantum confinemen
ISSN号:2046-2069
期刊名称:RSC Advances
时间:0
页码:3254-3256
相关项目:β-FeSi2纳米颗粒的制备及其量子限制的发光特性研究
作者:
He, J. Y.|Wang, X.|Wu, X. L.|Chu, Paul K.|
同期刊论文项目
β-FeSi2纳米颗粒的制备及其量子限制的发光特性研究
期刊论文 12
同项目期刊论文
Twinning Ge0.54Si0.46 nanocrystal growth mechanism in amorphous SiO2 films
Si-Si optical phonon behavior in localized Si clusters of SixGe1-x alloy nanocrystals
Synthesis of Crystalline beta-FeSi2 Under High-Temperature and High-Pressure
Porous silicon based beta-FeSi(2) and photoluminescence
Identification of local silicon cluster nanostructures inside Si(x)Ge(1-x) alloy nanocrystals by Ram
High-Efficiency Electrochemical Hydrogen Evolution Based on Surface Autocatalytic Effect of Ultrathi
Electronic structure and optical properties of beta-FeSi2(100)/Si(001) interface at high pressure
Tunable electroluminescence from polymer-passivated 3C-SiC quantum dot thin films
Resonant energy transfer from nanocrystal Si to β-FeSi2 in hybrid Si/β-FeSi2 film