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Etching characteristics and plasma-induced damage of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O-
  • ISSN号：0167-9317
  • 期刊名称：Microelectronic Engineering
  • 时间：0
  • 页码：631-637
  • 语言：英文
  • 相关项目：稀土掺杂铁电薄膜的上转换效率及其发光机理研究
作者： Guo, Tao|Pan, Ruikun|Zhang, Tianjin|Zhang, Baishun|Quan, Zuci|Jiang, Juan|
同期刊论文项目
稀土掺杂铁电薄膜的上转换效率及其发光机理研究
期刊论文 32 会议论文 4
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