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65nm工艺大容量2W/8R高速SDP存储器的设计
  • ISSN号:1000-1239
  • 期刊名称:计算机研究与发展
  • 时间:0
  • 页码:63-67
  • 分类:TP274[自动化与计算机技术—控制科学与工程;自动化与计算机技术—检测技术与自动化装置] TN386[电子电信—物理电子学]
  • 作者机构:[1]College of Computer, National University of Defense Technology, Changsha 410073, China
  • 相关基金:Project supported by the State Key Program of the National Natural Science of China (Grant No. 60836004) and the National Natural Science Foundation of China (Grant Nos. 61076025 and 60906014).
  • 相关项目:纳米级动态电路自动验证方法研究
中文摘要:

In this paper,we investigate the temperature and drain bias dependency of single event transient(SET) in 25-nm fin field-effect-transistor(FinFET) technology in a temperature range of 0-135°C and supply voltage range of 0.4 V-1.6 V.Technology computer-aided design(TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135°C.The charge collected increases from 45.5 fC to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V.Furthermore,simulation results and the mechanism of temperature and bias dependency are discussed.

英文摘要:

In this paper, we investigate the temperature and drain bias dependency of single event transient (SET) in 25-nm fin field-effect-transistor (FinFET) technology in a temperature range of 0-135 ℃ and supply voltage range of 0.4 V- 1.6 V. Technology computer-aided design (TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135 ℃. The charge collected increases from 45.5 ℃ to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V. Furthermore, simulation results and the mechanism of temperature and bias dependency are discussed.

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期刊信息
  • 《计算机研究与发展》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国科学院计算技术研究所
  • 主编:徐志伟
  • 地址:北京市科学院南路6号中科院计算所
  • 邮编:100190
  • 邮箱:crad@ict.ac.cn
  • 电话:010-62620696 62600350
  • 国际标准刊号:ISSN:1000-1239
  • 国内统一刊号:ISSN:11-1777/TP
  • 邮发代号:2-654
  • 获奖情况:
  • 2001-2007百种中国杰出学术期刊,2008中国精品科...,中国期刊方阵“双效”期刊
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,荷兰文摘与引文数据库,美国工程索引,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:40349