中文摘要：

在超高速发射技术研究中，缓）中层材料起着十分重要的作用。通过数值计算，分析了TPX缓冲层材料的厚度对高阻抗钽飞片超高速发射速度的影响，给出了最优的缓冲层材料厚度，对于0．3和0．5mm厚的钽飞片，选取不同厚度的TPX缓冲层材料，钽飞片中心速度的相对误差达到5％～6％；为了比较不同缓冲层材料对钽飞片速度的影响，还给出了相同厚度的TPX和Lexan材料作缓冲层时，钽飞片的中心速度和压力历史的二维计算结果。

英文摘要：

Buffer material plays an important role in the hypervelocity launching experiments. By using numerical calculations,the influence of TPX buffer material＇s thickness on high impedance tantalum flier plate＇s velocity is analyzed, and the optimal thickness of buffer material is also evaluated. For thickness of 0.3 mm and 0.5 mm tantalum flier plate,the relative error of tantalum flier plate＇s center velocity is about 5%～6% at different thicknesses of the TPX buffer materials. In order to compare the influence of different buffer materials on tantalum flier plate＇s velocity, the two-dimensional results of tantalum flier plate＇s center velocity and pressure histories are calculated at the same thickness of TPX and Lexan buffer.