以甲基丙烯酸(MAA)、丙烯腈(AN)、丙烯酰胺(AM)和甲基丙烯酸甲酯(MMA)为单体,用γ射线辐射引发聚合,形成MAA/AN/AM的共聚物和PMMA,然后使用热处理酰亚胺化制备了聚甲基丙烯酰亚胺(PMI),同时PMMA降解形成微孔结构。红外光谱分析表明:在选定温度条件下热处理过程中,相应基团酰亚胺化和PMMA降解成孔同时进行;TG.DSC分析结果表明,所得微孔材料的起始热分解温度达345E;扫描电镜观察发现,所得产物为闭孔结构的聚甲基丙烯酰亚胺微孔材料,孔径约为100gm。
Methylacrylic acid (MAA), acrylonitrile (AN), acrylamide (AM) and methyl methacrylate (MMA) were polymerized by μ-rays, and AN/AM/MAA copolymer as well as polymethylmethacrylate (PMMA) were synthesized. Then microporous structure of polymethacrylimide (PMI) was obtained by the degradation of PMMA using heat-treatment. FIIR spectra showed that imide process and PMMA degradation were simultaneous at the selected temperature. TG-DSC analysis showed that the sample began to degrade at 345℃. And SEM photos indicated that microporous PMI with obturator foramen structure was obtained, whose aperture was about 100 μm.