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不同形貌Ga2O3纳米材料可控合成工艺研究
  • 期刊名称:稀有金属材料与工程, 36, 增2, 296-298, 2007
  • 时间:0
  • 分类:TQ174.6[化学工程—陶瓷工业;化学工程—硅酸盐工业] TB383[一般工业技术—材料科学与工程]
  • 作者机构:[1]青岛科技大学,山东青岛266042, [2]清华大学深圳研究院,广东深圳518057
  • 相关基金:国家自然科学基金(50572041)、山东省自然科学基金(Y2005F08)、青岛市科技发展计划基金(05-1-GX-06)、山东省教育厅项目(J06A02)资助
  • 相关项目:大量SiC一维纳米材料及阵列的低成本合成、机理及物性研究
中文摘要:

通过研究基片种类、加热温度、保温时间、冷却速度及是否加入催化剂等不同工艺参数对低维Ga2O3,纳米材料形貌的影响,确定出合成5种不同形貌β-Ga2O3纳米材料的工艺条件。场发射扫描电镜(FE-SEM)表明5种不同形貌α-Ga2O3纳米材料分别为纳米线、纳米棒、纳米带、纳米环及纳米片。X射线衍射(X-ray)分析结果表明不同形貌纳米材料均为晶格常数日=1.223nm,b=0.304nm,c=0.58nm,a=90°,β=103.7°,γ=90°的单斜晶系β-Ga2O3晶体。

英文摘要:

The influences of substrate categories, heating temperature, heat preservation time, cooling ratio and catalyst-assisted or catalyst-free were investigated on the morphologies of Ga2O3 nanomaterials, the process conditions for different morphologies fl-Ga2O3 nanomaterials were concluded. Field emission scanning electronic microscope (FE-SEM) indicated that the resulting materials were nanowires, nanorods, nanobelts, nanoring and nanoslice. X-ray diffraction(XRD) showed that all the received nanomaterials were monoclinic floGa2O3 crystalline with the lattice constant: a = 1.223 nm, b = 0.304 nm, c =0.58 nm, a=90°, fl=103.7°,γ=90°. The growth mechanism for the products was discussed in the end.

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