镁基储氢材料是非常具有应用前景的一类储氢材料,具有储氢量大、环境友好、成本低等优点。采用磁控溅射法在单晶Si和非晶玻璃基底上沉积了纳米纯Mg薄膜。通过改变沉积速率,获得了不同生长形态和形貌的镁薄膜。采用X射线衍射光谱法(XRD)和扫描电子显微镜法(SEM)研究了Mg薄膜在不同基片和沉积速率下的生长模式。研究结果表明:改变沉积速率可以影响纯Mg薄膜的择优生长形态和形貌,即功率增加时,薄膜由〈101〉向择优生长转变为〈002〉+〈103〉向择优生长,晶粒尺寸变大,但仍按柱状晶方式生长;基片的类型对择优生长方向影响不大,对生长形貌有一定影响。
Mg based hydrogen storage materials are promising for industrial applications owing to their high gravimetric hydrogen storage,environment friendly nature and low cost.In the present work,pure Mg films were deposited onto single crystalline Si and glass substrates using magnetron sputtering method.The morphology and growth behaviors of the films were studied by XRD and SEM techniques.Our results show that,Mg films have a columnar type grain growth with a strongly preferred growth direction,changing from 101 orientation to 002+103 orientation when the deposition rate increases.The grain size of the Mg films increases with the increasing deposition rate.The type of substrate has little effect on the preferred growth orientations but influences the growth morphology.