针对多晶硅太阳能电池表面反射率高的问题,提出了激光电化学复合绒面制备方法,采用倍频YAG激光结合NaOH溶液,在多晶硅表面进行织构化处理,获得分布均匀的光陷阱结构。通过扫描电镜、超景深三维显微镜和分光光度计分析了织构化后多晶硅片的表面形貌和反射率。结果表明,激光电化学复合绒面处理后的多晶硅表面对波长400~760nm可见光的反射率整体降低至10%以下。试验证实了多晶硅表面激光电化学复合绒面的可行性和有效性,为多晶硅的减反射绒面处理提供了一种新的技术途径。
In order to solve the problem of high reflectivity on the surface of multicrystalline silicon solar cell, a hybrid texturization processing combined laser machining and electrochemical machining (LM-ECM)was put forward. Symmetrical microstructure was made by the hybrid processing with YAG laser at second harmonic wavelength and NaOH solution. The surface morphology and reflectivity of textured multicrystalline silicon were measure and analyzed by SEM, ultra-depth three-dimensional microscope and spectrophotometer. The results show that the reflectivity of the processed multicrystalline silicon surface can be reducedto be less than 10% under the visible light with the wavelength range of 400-760 nm. It is confirmed that LM- ECM is feasible and useful in texturization. It provides a new texturization technology to reduce reflectivity of multicrystalline silicon.