中文摘要：

使用磁控溅射制备Ag和SiO2相间的多层膜，系统研究了退火对复合薄膜形貌和光学特性的影响。实验发现退火时间越长，Ag颗粒直径越大，吸收谱峰位相对较短的退火时间有红移现象，并且吸收谱峰比较宽，比较强。在退火时间足够长的情况下，随着每层SiO2厚度的减小，Ag颗粒直径也减小，吸收峰强度变小，峰宽变窄，峰位有蓝移现象。我们做了大量实验，总结出了退火时间的计算公式。薄膜经过合适的退火时间，放置20d后发现出现小平面结构，Ag颗粒分裂，吸收谱峰宽变窄，吸收峰位蓝移。不同退火温度下的吸收谱表明500℃是一个比较理想的退火温度。

英文摘要：

Ag/SiO2 multilayer films on glass substrate were prepared by RF magnetron sputtering. The annealing influence to the morphology and the absorption properties of Ag-SiO2 composite films was studied. The diameter of Ag particles became bigger with a longer annealing time. The peak width of absorption spectrum became wider and more intensive and red shift occurred, compare to a relative short annealing time. If the annealing time is long enough, the diameter of Ag particles became smaller and absorption peak became weaker and narrower with a thinner thickness of SiO2, and blue shift occurred in the spectrum. The formula of annealing time was obtained from the experiments. Small facets parallel to substrate appeared and Ag particles under adequate annealing time were split into small particles after 20d. Accordingly, the peak of the absorption spectrum became narrower and blue shift took place. The absorption spectrum after different annealing temperature shows that the idea temperature is 500℃.