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半导体薄膜场发射中的膜厚影响
  • ISSN号:1000-7032
  • 期刊名称:发光学报
  • 时间:0
  • 页码:256-262
  • 语言:中文
  • 分类:O462.4[理学—电子物理学;理学—物理] TN873.95[电子电信—信息与通信工程]
  • 作者机构:[1]北京工业大学材料科学与工程学院薄膜材料实验室,北京100022, [2]中国科学院半导体研究所半导体材料重点实验室,北京100083
  • 相关基金:国家自然科学基金(10604001);北京市自然科学基金(4073029);北京市属市管高等学校人才强教计划;北京工业大学青年科研基金;北京工业大学博士科研启动基金资助项目
  • 相关项目:半导体多层超薄膜场发射冷阴极的制备及其结构增强机理研究
中文摘要:

考虑到薄膜中的电子散射,发展与完善了现有的场发射F-N(Fowler-Nordheim)模型,理论研究了不同厚度的半导体薄膜对其场发射性能的影响。结果表明:薄膜厚度对场发射性能的影响是非常显著的,随着薄膜厚度的增加,将相继出现极差膜厚值与最佳膜厚值,理论计算很好地验证了已有的实验结果;并进一步理论分析了半导体薄膜场发射性能随膜厚变化行为的物理实质,其可能来源于有效隧穿势垒面积的改变及电流密度在薄膜中的散射衰减。

英文摘要:

Recently, on the experiments, the characteristic of field electron emission of different novel semiconductor films and a variety of experimental methods to prepare semiconductor films have been paid more attentions. However, on the theories, there are rarely the related new reports. The main reason is that the traditional theories of field electron emission have not been adapted well to the novel nanomaterials which show different characteristics from the general semiconductor materials. So, it is necessary to set up a theoretical model to resolve the problem preliminarily. In the paper, by developing and improving conventional FowlerNordheim (F-N) field emission model considering electron scattering when electron transmits through the semiconductor film, the effect of thin-film thickness on field electron emission under the influence of an applied electric field has been studied theoretically. Barriers restricting electron transmission have an obviously change with the variation of the thickness of semiconductor film materials, so the current density of field electron emission also changed due to the variation of transmissive electron numbers. Results show that it is prominent for the effect of the film thickness on field electron emission. With the increase of the film thickness,there appears a worst film thickness value and an optimal film thickness value later for properties of field electron emission, which agreed well with some experimental reports. Correspond with this, the turn-on electric field appears a maximum and a minimum one after the other, however, the field electron emission current appears a minimum and a maximum one after the other. Furthermore, by analyses, distinct effects of the semiconductor film thickness on field electron emission may originate from the change of the area of effective tunneling barrier and the attenuation of electron scattering. Based on the model, not only some experimental results can be interpreted well, but also it can offer a theoretical guidance to the design of

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期刊信息
  • 《发光学报》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会发光分会 中国科学院长春光学精密机械与物理研究所
  • 主编:申德振
  • 地址:长春市东南湖大路3888号
  • 邮编:130033
  • 邮箱:fgxbt@126.com
  • 电话:0431-86176862
  • 国际标准刊号:ISSN:1000-7032
  • 国内统一刊号:ISSN:22-1116/O4
  • 邮发代号:12-312
  • 获奖情况:
  • 物理学类核心期刊,2000年获中国科学院优秀期刊二等奖,中国期刊方阵“双效”期刊
  • 国内外数据库收录:
  • 美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:7320