中文摘要：

利用表面等离子体共振效应理论及金属一介质复合膜的特殊纳米光学效应对平面多层膜超分辨光刻技术进行了研究．在曝光光源为365nm的情况下，实现周期230nm，线宽100nm的超分辨光刻成像．讨论了均匀金属一介质多层膜的结构参数选择，并通过数值仿真得到有效的光强度和对比度，然后用等离子体纳米光刻进行试验验证，通过最优化选择，最终得到了亚波长结构多层膜的大区域范围超分辨成像．

英文摘要：

Abstract Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.