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Minimum size of 180 degree domains in ferroelectric thin films covered by electrodes
  • 时间：0
  • 分类：O322[理学—一般力学与力学基础;理学—力学]
  • 作者机构：[1]School of Mechanical and Power Engineering, Harbin University of Science and Technology, Harbin 150080, P. R. China, [2]School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275, P. R. China
  • 相关基金：Project supported bY the National Natural Science Foundation of China （Nos.50232030, 10172030 and 10572155）
  • 相关项目：纳米铁电薄膜相变行为的尺寸及表面效应研究
关键词： 铁电薄膜, 180°域, 稳定性分析, 倒转开关, ferroelectric film, 180° domain, stability analysis, back switching
中文摘要：

Corresponding author LIU Yu-lan, Professor, Doctor, E-mail： stslyl@zsu.edu.cn

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