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Enhanced Chemical Vapor Deposition of Copper Films on the Self-assembled Monolayers as Ultrathin Dif
  • 期刊名称：J. Electrochem. Soc.
  • 时间：0
  • 作者或编辑：3448
  • 第一作者所属机构：浙江大学化学系
  • 页码：153(3), C142-C145
  • 语言：英文
  • 相关项目：二阶段式化学气相沉积成长铜薄膜及其反应机理研究
作者： Xin Liu|Qi Wang（王琦*）|Song Wu|Zengzeng Liu|
同期刊论文项目
二阶段式化学气相沉积成长铜薄膜及其反应机理研究
期刊论文 18 会议论文 1
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