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Reducing the contact resistance of SiNW devices by employing a heavily doped carrier injection layer
ISSN号:0957-4484
期刊名称:Nanotechnology
时间:2012.8.8
页码:1-6
相关项目:波纹化石墨烯纳米条带的制备及器件特性研究
作者:
Zhang, Guangyu|Shi, Zhiwen|Zhang, Lianchang|He, Congli|Zhang, Jing|Cheng, Meng|Yang, Rong|Tian, Xuezeng|Bai, Xuedong|
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波纹化石墨烯纳米条带的制备及器件特性研究
期刊论文 11
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