中文摘要：

通过改变激光脉冲能量和激光聚焦位置,进行了激光诱导向前转移铜箔的实验,并通过超景深三维显微镜和扫描电子显微镜对基片和约束层上沉积的铜箔进行了观察,探讨了激光脉冲能量和激光聚焦位置对铜沉积效果所产生的影响,在此基础上研究了激光诱导向前转移的机理。研究结果表明,在石英玻璃基片上沉积的铜箔直径最小可达10μm,远小于激光光斑直径;在约束层上也沉积有铜箔,即同时出现了激光诱导向后转移的现象;光脉冲能量增大,石英玻璃上沉积的铜箔逐渐分散,尺寸逐渐增大,而且呈环形分布;通过调节靶材离焦点距离,可以使环形消失,并使沉积尺寸降到激光光斑尺寸以下。最后成功实现了微细阵列的激光诱导沉积。

英文摘要：

The experiments on the LIFT of Cu film were carried out through changing pulse energy and defocus distances.The materials transferred on the quartz substrate and the restraint layers were investigated,and the effects of pulse energy and defocus distances were analyzed by the optical microscope and scanning electron microscope.The mechanism of LIFT was discussed based on the experimental results.A transfer dot of about 10μm is found,and which is much smaller than the focal radius.The transferred materials are found on both of the substrate and the restraint layers,which means that there exists a backward transfer process along with forward transfer.With pulse energy increasing,the materials deposited on the substrate become more scattered,and the distribution of the deposition dots tend to form a ring.When the enlarging focal distances are enlarged,the ring disappears,and the deposition area shrinks below the foal radius.And a micro array was successfully fabricated using the LIFT method.