为有效去除水体污染物磺胺类抗生素(Sulfonamides antibiotics,SAs),采用高级氧化紫外/双氧水(UV/H_2O_2)和紫外/过硫酸盐(UV/PS)工艺降解磺胺甲基嘧啶(sulfamerazine,SM1)。研究表明,紫外与氧化剂(H_2O_2,PS)联用可显著提高去除率,其反应符合拟一级动力学模型。磺胺甲基嘧啶的去除率在一定范围随着氧化剂H_2O_2和PS的浓度升高而升高;磺胺甲基嘧啶初始质量浓度越大,反应速率越小。两种工艺降解磺胺甲基嘧啶最大去除率均发生在pH=3。NaCl会抑制两种工艺对目标污染物的降解,而适当的NaHCO_3可促进其降解反应的进行。腐植酸的存在对两种工艺降解污染物均会产生抑制作用。
In order to effectively remove sulfonamides antibiotics in aqueous solution,the advanced oxidation ultraviolet / hydrogen peroxide and ultraviolet / persulfate technology are used to degrade sulfamerazine. Research shows that it can obviously improve the removal rate when adding oxidizers H_2O_2 and PS,and degradation process conforms first order kinetics model. Within a certain concentration of oxidizers H_2O_2 and PS,the removal rate of sulfamerazine will be improved with the increase of oxidant concentration; the reaction rate decreases with the increase of sulfamerazine initial concentration; when pH = 3,the maximum removal rate all happens by these two kinds of sulfamerazine degradation processes. NaCl has inhibiting effect on these two technologies,but appropriate NaHCO_3 has acceleration effect on it. Humic acids has inhibiting effect on the two kinds of degradation technologies.