位置：成果数据库 > 期刊 > 期刊详情页
An adaptive-tuning scheme for G&P EWMA run-to-run control.
  • ISSN号：0894-6507
  • 期刊名称：Ieee Transactions On Semiconductor Manufacturing
  • 时间：0
  • 页码：230-237
  • 相关项目：基于局部建模的大范围工况系统优化控制
作者： C.C. Chang| T.H. Pan| D.S.H. Wong| S.S. Jang.|
同期刊论文项目
基于局部建模的大范围工况系统优化控制
期刊论文 29 会议论文 9 专利 6
同项目期刊论文
Plantwide Control of CO2 Capture by Absorption and Stripping Using Monoethanolamine Solution
Development of a Novel Soft Sensor Using a Local Model Network with an Adaptive Subtractive Clusteri
A Virtual Metrology System for Predicting End-of-Line Electrical Properties Using a MANCOVA Model Wi
Statistical multi-model approach for performance assessment of cooling tower
Electricity Gain via Integrated Operation of Turbine Generator and Cooling Tower Using Local Model N
A G&P EWMA algorithm for high-mix semiconductor manufacturing processes
Consumption optimization by Run to Run control with zone control
Development of a virtual metrology for high-mix TFT-LCD manufacturing processes
A virtual metrology model based on recursive canonical variate analysis with applications to sputter
Integrating MANCOVA and IMA (1, 1) approximation to enhance prediction accuracy for high-mix product
Statistical key variable analysis and model-based control for improvement performance in a deep reac
Chamber matching of semiconductor manufacturing process using statistical analysis
Recognition of chemical compounds in contaminated water using time-dependent multiple dose cellular
Robust Stability of uncertain systems over network with bounded packet loss
Dynamic canonical correlation analysis for online quality Estimation in an Industrial Sputtering Pro
两个异结构超混沌系统的广义投影同步