位置:成果数据库 > 期刊 > 期刊详情页
凹槽涂胶的实时光学检测方法研究
  • ISSN号:1001-5868
  • 期刊名称:《半导体光电》
  • 时间:0
  • 分类:TP391.41[自动化与计算机技术—计算机应用技术;自动化与计算机技术—计算机科学与技术] TN405[电子电信—微电子学与固体电子学]
  • 作者机构:School of Mechanical and Electronical Engineering and State Key Laboratory of High Performance Complex Manufacturing,Central South University
  • 相关基金:supported by National Natural Science Foundation of China (No. 51275536);the China High Technology R&D Program 973 (No. 2015CB057206)
中文摘要:

The dipping process was recorded firstly by high-speed camera system; acceleration time, speed, and dipping time were set by the control system of dipping bed, respectively. By image processing of dipping process based on Otsu’s method, it was found that low-viscosity flux glue eliminates the micelle effectively, very low speed also leads to small micelle hidden between the bumps, and this small micelle and hidden phenomenon disappeared when the speed is ≥0.2 cm s-1. Dipping flux quantity of the bump decreases by about 100 square pixels when flux viscosity is reduced from4,500 to 3,500 mpa s. For the 3,500 mpa s viscosity glue, dipping flux quantity increases with the increase of the speed and decreases with the increase of the speed after the speed is up to 0.8 cm s-1. The stable time of dipping glue can be obtained by real-time curve of dipping flux quantity and is only 80–90 ms when dipping speed is from 1.6 to 4.0 cm s-1. Dipping flux quantity has an increasing trend for acceleration time and has a decreasing trend for acceleration. Dipping flux quantity increases with the increase of dipping time, and is becoming saturated when the time is ≥55 ms.

英文摘要:

The dipping process was recorded firstly by high-speed camera system; acceleration time, speed, and dipping time were set by the control system of dipping bed, respectively. By image processing of dipping process based on Otsu's method, it was found that low-viscosity flux glue eliminates the micelle effectively, very low speed also leads to small micelle hidden between the bumps, and this small micelle and hidden phenomenon disappeared when the speed is >= 0.2 cm s(-1). Dipping flux quantity of the bump decreases by about 100 square pixels when flux viscosity is reduced from 4,500 to 3,500 mpa s. For the 3,500 mpa s viscosity glue, dipping flux quantity increases with the increase of the speed and decreases with the increase of the speed after the speed is up to 0.8 cm s(-1). The stable time of dipping glue can be obtained by real-time curve of dipping flux quantity and is only 80-90 ms when dipping speed is from 1.6 to 4.0 cm s(-1). Dipping flux quantity has an increasing trend for acceleration time and has a decreasing trend for acceleration. Dipping flux quantity increases with the increase of dipping time, and is becoming saturated when the time is >= 55 ms.

同期刊论文项目
同项目期刊论文
期刊信息
  • 《半导体光电》
  • 中国科技核心期刊
  • 主管单位:信息产业部
  • 主办单位:中国电子科技集团公司第四十四研究所(重庆光电技术研究所)
  • 主编:江永清
  • 地址:重庆市南岸区南坪花园路14号
  • 邮编:400060
  • 邮箱:soe@163.net
  • 电话:023-65860286
  • 国际标准刊号:ISSN:1001-5868
  • 国内统一刊号:ISSN:50-1092/TN
  • 邮发代号:
  • 获奖情况:
  • 重庆市首届十佳期刊称号,1999年,信息产业部1999-2000年度优秀电子期刊称号
  • 国内外数据库收录:
  • 美国化学文摘(网络版),荷兰文摘与引文数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:5924