中文摘要：

采用在线化学气相沉积（CVD）法对全硅MFI型分子筛膜进行晶内孔道修饰，考察晶间缺陷对膜晶内孔道修饰效果的影响。采用硅烷水解法对缺陷较多的膜进行缺陷孔的修补，结合扫描电子显微（SEM），观察膜微结构的变化。结果表明：分子筛膜表面缺陷显著影响晶内孔道调变效果。500℃时，缺陷较少的膜经晶内修饰后H2／CO2分离因子由修饰前的2．7提高到42．3，H2渗透性由2．25×10^-7mol／（m^2·s·Pa）降至1．52×10^-7mol／（m^2·s·Pa）。经缺陷修补后的分子筛膜，其晶内修饰后的H2／CO2分离因子比未修补的膜有一定幅度的提高。

英文摘要：

Intracrystalline pores of all-siliceous MFI-type zeolite membrane were modified by online chemical vapor deposition （CVD）. The effect of intercrystalline defects on intracrystalline pore modification of the membrane was investigated. Hydrolysis of silane was also used to heal nonzeolitic pore of the membrane. The microstructure change of membrane was characterized by scanning electron microscope （SEM）. The results showed that the defects significantly influenced the modification. For the membrane with few defects, H2/CO2 separation factor increased from 2.7 to 42.3 via modification at 500 ℃, while H2 permeance decreased from 2.25×10^-7mol/（m^2·s·Pa） to1.52×10^-7mol/（m^2·s·Pa）. After modification, the H2/CO2 separation factor of membrane with intercrystalline defects treatment was better than that without intercrystalline defects treatment.