中文摘要：

以粒径为270 nm的SiO_2微球胶体晶体作为模板,向其中填充过量单体MMA,热聚合后形成SiO_2/PMMA复合结构光子晶体,将此光子晶体浸泡入浓度为20%的HF溶液中,刻蚀半小时后得到脱离ITO玻璃基板的柔性PMMA反蛋白石结构薄膜.该薄膜为周期有序的三维多孔结构,孔径大小均一,约为210 nm,外观蓝紫色与测试得到的带隙位置相对应.分析其微观形貌可知,对模板的过量填充产生了一层附着于胶体晶体上表面的PMMA致密层,致密层与其下层PMMA反蛋白石结构骨架在热聚合过程中由于体积收缩产生一定的应力差,使反结构薄膜自发从原基板脱离,从而获得柔性反蛋白石结构光子晶体.该薄膜可用于柔性光子晶体器件的制备.

英文摘要：

SiO_2 colloidal crystals with silicon spheres diameter of 270 nm were used as templates and MMA was filled in the gap of silica spheres.SiO_2 /PMMA photonic crystal with a overlayer of PMMA was obtained by polymerization reaction.SiO_2/PMMA was immersed in a 20 wt%HF aqueous solution.After etching half an hour,the flexible PMMA film with inverse opal structure peeled off from the TIO glass substrates.The thin film is a kind of periodic and ordered three-dimensional porous structure with uniform pore size of 210 nm,the color of the film is bluish violet which is relative to the position of the band gap.By analysising of the microstructure,the course of the formation of flexible film was studied.In the stage of polymerization,the bulk shrinkage was more in the overlayer than in the interstitial spaces,due mostly to the mechanical resistance provided by the close-packed spheres.Stress difference between the surface and under sruface made the inverse film failed off from the ITO glass.This kind of film can be used for the preparation of flexible photoelectronic devices.