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Raman-scattering characterization of InN films grown by pressurized metal organic vapor phase epitax
  • ISSN号：1521-3951
  • 期刊名称：phys. stat. sol. (b
  • 时间：2011.12.21
  • 页码：779-783
  • 相关项目：高InN组分InGaN材料生长机理的研究
作者： Hiroshi Harima|Kenji Kisoda|Yu Huai Liu|Takashi Matsuoka|
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高InN组分InGaN材料生长机理的研究
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