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Modeling of 3-D trench structures with corrected effective medium approximation for model-based infr
  • 所属机构名称：华中科技大学
  • 会议名称：2010 3rd International Nanoelectronics Conference, INEC 2010
  • 成果类型：会议
  • 会场：Hongkong, China
  • 相关项目：高深宽比微纳层次结构的仿壁虎毛参数优化设计与制作工艺研究
作者： Shi, Tielin|Liu, Shiyuan|Zhang, Chuanwei|
同会议论文项目
高深宽比微纳层次结构的仿壁虎毛参数优化设计与制作工艺研究
期刊论文 20 会议论文 12 专利 1
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