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Metrology of deep trench structures in DRAM using FTIR reflectance spectrum
  • 所属机构名称：华中科技大学
  • 会议名称：2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Tech
  • 成果类型：会议
  • 会场：Beijing, China
  • 相关项目：高深宽比微纳层次结构的仿壁虎毛参数优化设计与制作工艺研究
作者： Liu, Shiyuan|Zhang, Chuanwei|Shi, Tielin|
同会议论文项目
高深宽比微纳层次结构的仿壁虎毛参数优化设计与制作工艺研究
期刊论文 20 会议论文 12 专利 1
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