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Wear Rate Leveling: Lifetime Enhancement of PRAM with Endurance Variation
  • 所属机构名称：中国科学院计算技术研究所
  • 会议名称：IEEE/ACM Design Automation Conference (DAC)
  • 时间：2011.6.6
  • 成果类型：会议
  • 相关项目：三维芯片中硅直通孔和晶片电路的测试技术研究
作者： Jianbo Dong|Lei Zhang|Yinhe Han*|Xiaowei Li|
同会议论文项目
三维芯片中硅直通孔和晶片电路的测试技术研究
期刊论文 13 会议论文 13 专利 3
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