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Schottky barrier height modulation for advanced source/drain contact
  • 所属机构名称：复旦大学
  • 会议名称：19th Asia-Pacific workshop on fundamentals and applications of advanced semiconductor devices
  • 成果类型：会议
  • 相关项目：Si(110)衬底上杂质分凝肖特基结源漏形成及其机理研究
作者： 蒋玉龙|
同会议论文项目
Si(110)衬底上杂质分凝肖特基结源漏形成及其机理研究
期刊论文 10 会议论文 8 专利 3
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