中文摘要：

用循环伏安和电位阶跃法研究Au在氧化铟锡（ITO）透明导电膜玻璃表面的电沉积过程的初期阶段.发现在ITO表面Au的电沉积经历成核过程以及受[AuCl4]-扩散控制的晶核生长过程.通过改变扫描速率分析循环伏安曲线的变化,当扫描速率较快时,发现Au在ITO表面的沉积过程经历[AuCl4]-→[AuCl2]-→Au两步进行;当扫描速率较慢时,受歧化反应作用影响而只表现为一步沉积[AuCl4]-→Au.通过电位阶跃实验,验证了Au的两步沉积过程,并求得[AuCl4]-的扩散系数为1.3×10-5cm2·s-1.将成核曲线与理论曲线对照,得出Au在ITO表面的沉积符合瞬时成核理论.通过场发射扫描电镜（FE-SEM）对Au核形貌进行分析,根据扫描电镜图可以得到阶跃时间和阶跃电位对电沉积Au的形貌的影响.

英文摘要：

Cyclic voltammetric and chronoamperometric methods were used to study the initial stage of Au electrodeposition on an indium tin oxide （ITO） surface.The nucleation process was controlled by the diffusion of [AuCl4].The cyclic voltammetry curves showed that the electrochemical reduction included two steps which were [AuCl4] → [AuCl2],and [AuCl2] → Au.Only one reduction peak was observed when the scan rate was comparatively slow and this peak separated into two peaks when the scan rate was increased.This phenomenon resulted from the disproportionation of [AuCl2] during the electrodeposition process.Chronoamperometry also proved the two step reaction mechanism and the diffusion coefficient of [AuCl4] was calculated to be 1.3×10-5 cm 2 · s-1.From the theoretical nucleation curves,an instantaneous three-dimensional nucleation mechanism was proposed for the nucleation of gold on ITO.Au electrodeposits were observed by field emission scanning electron microscopy （FE-SEM）.SEM images of the electrodeposits showed that the morphology of the gold deposits was affected by the electrochemical deposition potential and time.